Abstract
The quill effect is a laser writing phenomenon in which different fabrication effects occur, depending upon the direction of laser translation. It has not yet, to our knowledge, been studied in the low-loss-waveguide (LLW) writing regime, probably due to its very weak visibility under conventional transmission microscope in that regime. In this report, with the help of adaptive third harmonic generation microscopy, we reveal the quill effect in the LLW writing regime and show its influences on the properties of laser-written photonic integrated components, in terms of polarization-related properties in fused silica and beam-splitting ratios of three-waveguide-coupler in borosilicate glass.
Highlights
The quill effect [1], which manifests as a change in material modification when reversing the writing direction of ultrafast laser direct writing, has been actively studied over the last decade since it was reported by Poumellec and associates [2]
Kazansky et al suggested the quill effect arises from pulse front tilt (PFT) of the writing beam [1], which is supported by following works [3,4,5]
By means of adaptive third harmonic generation (THG) microscopy [16,17], we visualize the quill effect in LLW writing regime and reveal its influence on the polarization-related properties of low loss waveguides in fused silica, as well as on the beamsplitting-ratios of a three-waveguide-coupler in borosilicate glass
Summary
The quill effect [1], which manifests as a change in material modification when reversing the writing direction of ultrafast laser direct writing, has been actively studied over the last decade since it was reported by Poumellec and associates [2]. Understanding the quill effect in the LLW writing regime and in both fused silica and another commonly used glass-borosilicate glass [10,11,12,13,14] is very important for the design and fabrication of femtosecond-laser-written photonic integrated circuits (FLW-PIC). Such highly demanding applications in this area include polarization sensitive quantum information processing based upon photons [11,12,13,14,15], which impose strict requirements on the polarization properties of the fabricated FLW-PIC components. By means of adaptive third harmonic generation (THG) microscopy [16,17], we visualize the quill effect in LLW writing regime and reveal its influence on the polarization-related properties of low loss waveguides in fused silica, as well as on the beamsplitting-ratios of a three-waveguide-coupler (tritter) in borosilicate glass
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