Abstract
AbstractDelta doping of diamond constitutes a very promising route to fabricate novel generation of high power and high frequency electronic devices. However, the achievement of abrupt interfaces between highly boron doped and undoped layers requires the shortest residence times of reactive species in the substrate vicinity. We report here on an innovative gas injection system especially designed to reduce this residence time. This technique was applied to fabricate sharp rising and decaying boron interfaces. According to SIMS profiles, the sharpest profiles were obtained on decaying interfaces exhibiting doping gradients close to 1.5 nm per decade over five decades of boron concentrations, namely from 1016 to 1021 atoms/cm3. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have