Abstract
Ultra-long highly ordered organic nanowires arrays were in situ self-assembled directly on the silicon substrate over a large area based on solution process. The location and the orientation of the nanowires arrays can be easily tuned and controlled by optimizing the motion of the substrate and the solvent evaporation rate during dip-coating process. By precisely adjusting the motion of the substrate, the length limits for nanowires in array caused by the sticking-slipping motion of the contact line in a concentrated solution have been successfully broken through. The longest nanowires array with a length of around 1000µm was obtained from concentrated solution.
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