Abstract
Standard optical lithography relying on clean room and microelectronic facilities is used to fabricate a thin-flexible metamaterial absorber, designed to operate at submillimeter wavelengths over the 0.1-1 THz frequency band. Large terahertz absorption has been demonstrated numerically and through experimental measurements with a maximum level of about 80%. We put emphasis in this present work on the use of single-sized "meta-cells" to achieve multiple absorption peaks. Furthermore, the use of a thin-flexible dielectric spacer makes it promising for stealth technology applications in order to disguise objects and make them less visible to radar and other detection methods.
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