Ultra-fast photoluminescence in fused silica surface flaws susceptible to laser damage

Abstract

ABSTRACTUsing high-sensitivity confocal time-resolved photoluminescence (PL) techniques, we found an ultrafast PL (40 ps-5 ns) from impurity-free surface flaws on fused silica. This PL is excited by the single-photon absorption of sub-band gap light. Regions which exhibit this PL are strongly absorptive well below the band gap, as evidenced by a propensity to damage with 3.5 eV nanosecond-scale laser pulses. Very high defect densities are needed to explain the damage thresholds observed. For such high defect densities, significant interactions between defects may strongly affect the temporal characteristics of the emission of electronic excitations. We propose that the distribution in lifetimes observed is not simply due to a large variety of defect states, but due to a variety of energy transfer interactions between defect states.