Abstract
Using high-sensitivity confocal time-resolved photoluminescence (PL) techniques, we report an ultrafast PL (40 ps–5 ns) from impurity-free surface flaws on fused silica, including polished, indented, or fractured surfaces of fused silica, and from laser-heated evaporation pits. This PL is excited by the single-photon absorption of sub-band gap light, and is especially bright in fractures. Regions which exhibit this PL are strongly absorptive well below the band gap, as evidenced by a propensity to damage with 3.5 eV nanosecond-scale laser pulses.
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