Abstract
The surface sensitivity of x-ray photoelectron spectroscopy (XPS) has positioned the technique as a routine analysis tool for chemical and electronic structure information. Samples ranging from ideal model systems to industrial materials can be analyzed. Instrumentational developments in the past two decades have popularized ambient pressure XPS, with pressures in the tens of mbar now commonplace. Here, we briefly review the technique, including a discussion of developments that allow data collection at higher pressures. We illustrate the information XPS can provide by using examples from the literature, including MgO studies. We hope to illustrate the possibilities of ambient pressure XPS to Mg, MgO, and Mg(OH)2 systems, both in fundamental and applied studies.
Highlights
X-ray photoelectron spectroscopy (XPS) is a highly mature technique for surface elemental and chemical analysis, based on the photoelectric effect
Conventional XPS, suffers from the instrumental necessity of a high vacuum environment (
We hope to have demonstrated some of the versatility of ambient pressure x-ray photoelectron spectroscopy (APXPS) for the investigation of samples in ambient pressure conditions up to 10’s of mbar
Summary
X-ray photoelectron spectroscopy (XPS) is a highly mature technique for surface elemental and chemical analysis, based on the photoelectric effect. The technique allows pressures at the sample in the mbar regime, with a demonstrated maximum pressure of 130 mbar for a standard sample environment[5] and 1 bar for a graphene membrane-based one.[6] fundamental studies, such as on the hydroxylation of MgO and investigations of Mg(OH)[2] relevant to applications, can be conducted in ambient in situ and operando conditions using APXPS. The objective of this short review is to introduce the Mg community to APXPS. We primarily provide examples from other areas and make reference to MgO and Mg(OH)[2] research to demonstrate how the illustrated concepts find application
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