Abstract
Fabrication of ultrasharp tips for scanning tunneling microscopy is inherently a two-step procedure, typically involving an etch process and postetch cleaning. From the myriad of etching parameters available in literature a procedure is presented that allows quantitative optimization and the routine production of tips with 3–10 nm radius of curvature. These ideally shaped tips require final oxide removal. Utilizing a custom designed e-beam heater element, oxide removal without localized melting is realized.
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Schedule a callMore From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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