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https://doi.org/10.1149/1.2087098
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Cite Publication Date: Sep 1, 1990 | |
 Citations: 15 |  License type: iop-standard |
Two solutions for selectively etching on and on are presented. A solution of is shown to have a etch rate more than 50 times higher than the etch rate of . A solution of etches both and selectively relative to , with a selectivity of 8 or more for.
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