Tuning the feature size of nanoimprinting stamps: A method to enhance the flexibility of nanoimprint lithography

Abstract

In the field of nanoimprinting lithography, fabricating large-area imprinting stamps is often the most time- and resource-consuming step. Specifically in research, it is often not reasonable to produce a new imprinting stamp for each new experimental configuration. Therefore, the lack of flexibility in feature sizes makes prototyping and tailoring the feature sizes according to their application challenging. To overcome these restrictions, we developed an imprinting stamp reproduction and tuning method which enables the size of the features of existing imprinting stamps to be tuned within nanometer precision. For replication, we first fabricate a chromium nanoisland array on silicon dioxide using the to-be tuned imprinting stamp. Then, the silicon dioxide is anisotropically etched in a reactive ion etching process with chromium as a hard mask. The formed replica of the imprinting stamp is subsequently tuned in an isotropic etching step with hydrofluoric acid. The method enables us to tune the size of the features of our nanoimprinting stamps within nanometer precision without influencing their shape with a yield above 96%. The tuned stamps are then used to fabricate metal nanoisland arrays with the respective tuned sizes. To evaluate the influence of the feature sizes, we exemplarily study the plasmonic resonance of gold nanoisland arrays fabricated using stamps with different feature diameters. Here, we see a good agreement between measured and simulated plasmonic resonance wavelengths of the samples. Hence, with the tuning method, we can tailor specific size-dependent properties of our nanoisland arrays according to individual experiments and applications.