Abstract
Randomly subwavelength structures (SWSs) were fabricated by reactive ion etching (RIE) process on the fused silica substrate, on the basis of an advanced metal nanodot induced one-step self-masking technology. Metal fluoride nanodots induce the deposition of fluorocarbon polymer stably. It acts as micromasks during the RIE process. With an increase in radio frequency (RF) power, the average sample height increases, the aspect ratio of the structure becomes greater and more uniform, and the average optical transmittance increases. Moreover, the maximum transmittance for single-sided SWSs can reach 95.5%. The theoretical simulation is in good agreement with the experiment results. The calculated results indicate that the profile of prepared structures may be close to a cylinder profile.
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