Abstract
Pulsed laser deposition (PLD) which is thickness-adjustable deposition technique enables the fabrication of highly uniform monolayer and few-layer WSe2 thin film on a large-scale substrate, and these advances practical applicability of 2D material in the various field such as field effect transistor (FET) devices. More details can be found in article number 1800524 by Sehun Seo, Hojoong Choi, Sanghan Lee, and co-workers.
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