Abstract
The fabrication of flexible advanced devices is a very important issue that requires the hybrid integration of different nanostructured materials. In this work, we report on a new molding technique based on an improved hard UV-nanoimprint lithography process (hard UV-NIL) using a poly(dimethylsiloxane) (PDMS) film. The large-scale integration of a high-quality nanostructured gold pattern in PDMS is made possible with the use of an inorganic sacrificial layer soluble in hydrogen peroxide. A tunable diffraction gold stripe grating has been fabricated by transferring a 1 cm2 stripe grating from a rigid silicon substrate to a flexible PDMS substrate. As a result, we successfully demonstrate diffraction grating optical tunability when mechanical tension is applied.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
