TSV-Based 3-D ICs: Design Methods and Tools

Abstract

Vertically integrated circuits (3-D ICs) may revitalize Moore’s law scaling which has slowed down in recent years. 3-D stacking is an emerging technology that stacks multiple dies vertically to achieve higher transistor density independent of device scaling. They provide high-density vertical interconnects, which can reduce interconnect power and delay. Moreover, 3-D ICs can integrate disparate circuit technologies into a single chip, thereby unlocking new system-on-chip architectures that do not exist in 2-D technology. While 3-D integration could bring new architectural opportunities and significant performance enhancement, new thermal, power delivery, signal integrity and reliability challenges emerge as power consumption grows, and device density increases. Moreover, the significant expansion of CPU design space in 3-D requires new architectural models and methodologies for design space exploration (DSE). New design tools and methods are required to address these 3-D-specific challenges. This keynote paper focuses on the state of the art, ongoing advances and future challenges of 3-D IC design tools and methods. The primary focus of this paper is TSV-based 3-D ICs, although we also discuss recent advances in monolithic 3-D ICs. The objective of this paper is to provide a unified perspective on the fundamental opportunities and challenges posed by 3-D ICs especially from the context of design tools and methods. We also discuss the methodology of co-design to address more complicated and interdependent design problems in 3-D IC, and conclude with a discussion of the remaining challenges and open problems that must be overcome to make 3-D IC technology commercially viable.