Abstract
Trimethylboron as a precursor for boron phosphide plasma deposition at low temperature
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
https://doi.org/10.1116/6.0004065
Copy DOIPublication Date: Dec 5, 2024 |
Trimethylboron as a precursor for boron phosphide plasma deposition at low temperature
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.