Abstract
▪ Abstract Tribochemical polishing, a novel polishing technique, is based on the dissolution of material, stimulated by simultaneous friction at contacting asperities. It uses hard polishing pads (cast iron, stainless steel, ceramic) and a polishing solution free of abrasive particles. Tribochemical polishing of ceramics (Si3N4, SiC) and tungsten has been demonstrated. Surface roughnesses less than 1 nm and removal rates up to 3 μm per h have been achieved. A comparison with other polishing methods (e.g. chemical mechanical polishing) is given and the basic mechanisms governing the material removal are described. The possible chemical reactions between the polishing solution (H2O, CrO3) and the silicon nitride are discussed and compared with available literature.
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