Abstract
Phase transformations have been investigated that occur in Ti–Si contact subjected to processing with hydronitrogen plasma. Regularities of formation and growth of titanium nitride have been studied as a function of plasma irradiation parameters. Treatment of the Ti–Si system with hydronitrogen plasma makes it possible to form TiN films on silicon and results in formation of TiSi 2 at the interface, thus leading to changes in electrical and physical characteristics of the contact.
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