Abstract
Frequency-dependent conductance measurements were carried out to investigate the trap states in Al2O3/AlInGaN/GaN metal-insulator-semiconductor (MIS) heterostructures. From the electrical measurements, an improvement in trap state characteristics was observed for the device fabricated with lower In composition in quaternary nitride layers. In the presence of higher In composition, segregation of In atoms was observed in AlInGaN layers. Because of this In-segregation, surface quality of the quaternary-N deteriorated that led to the formation of trap states at and near the oxide/semiconductor interface. Therefore, in the presence of lower In composition, an improvement in trap characteristics was observed for the AlInGaN/GaN-based MIS devices.
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