Abstract
Nano-crystalline Ti and TiN thin-films fabricated on <100> P-type Si wafers via magnetron sputtering are characterized by transmission Kikuchi Diffraction (TKD) in an FEI Sirion scanning electron microscope (SEM). A simple and cost-effective sample preparation combined with the TKD experiment at working distance of ∼ 3 mm and a tilt of 35° produced indexable Kikuchi patterns. Pole figures generated by automatic and manual indexing revealed <0001>|| normal direction (ND) fiber texture and <111>||ND fiber texture in monolithic Ti and TiN thin-films, respectively. Glancing angle x-ray diffraction results corroborated the texture in the samples. Spatial resolution of ∼ 60 nm is achieved that is close to the limit of resolution in conventional electron backscatter diffraction (EBSD). It is demonstrated that a simple sample preparation method in TKD technique combined with selected area electron diffraction (SAED) in transmission electron microscope (TEM) may reveal fundamental knowledge about different mechanisms occurring during fabrication and processing of the thin-film systems.
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