Abstract

Multi-terminal memtransistors using polycrystalline monolayer molybdenum disulfide (MoS2) have recently emerged as novel synaptic devices. Due to the coexistence of disorder and strong Coulomb carrier-carrier interactions in MoS2, localization and delocalization of carriers can come into play successively upon the relative strength of disorder and interactions, which can be tuned by the Fermi level (EF). In this work, we show that the transition from trap-mediated to band-like transport leads to the resistive switching behavior in MoS2 memtransistors, which is driven by the EF shift arising from defect profile redistribution that is facilitated by grain boundaries. In the high resistance state, field-driven hopping conduction can be clearly observed in the high-field region (E>0.05 MV/cm), whereas the linear dependence of ln(I/E) on the square root of the electric field, E1/2, suggests Poole–Frenkel emission in the low-field region (E≤0.05 MV/cm). In the low resistance state, strong interactions prevailed and a substantial amount of thermally activated electrons are excited into the conduction band, leading to band-like transport.

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