Abstract
The manufacturing technology for heterojunction bipolar transistor (HBT) is different from the one used for bipolar silicon junction transistor (BJT). The base in case of BJT is manufactured by using diffusion and the diffusion laws determine a Gaussian type of profile in the base. HBT devices are manufactured using molecular epitaxy which gives a contact doping profile. In case of HBT, producing an internal field by using uniform doping is no more possible. This is the reason why was used in the gradation of the molar composition. The Analysis using Octave soft was made for the transit time through the base of the drift HBT transistors type GaAs/AlxGa1-xAs.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
