Abstract

We have successfully realized a nonvolatile resistive memory structure by rf-magnetron sputtering technique using nanoparticles synthesized by sol–gel method. The resistive switching (RS) related to the Au/TiO2 Schottky contact was grafted on a photosensitive structure ITO/ZnO:Al/p-Si allowing memory effect switching optically activated. The RS takes place via tunneling path through potential barrier located at the Au/TiO2 interface. The memory effect persists under illumination and the Arrhenius plot of the surface of the V–I cycle shows an activation energy of about 160 meV in dark and 100 meV under visible illumination. This behavior of the RS optically activated is closely related to the electronic states in the Au/TiO2 interface which leads to perform an optical switching of the memory effect with the presented structure.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call