Abstract
Flow of fixing of hot spot induced by optical variation among exposure tools is discussed for quick ramp-up of high volume products. To achieve robust pattern formation for optical variation, following hot spot detection and fixing approaches are introduced: i) at the design stage, hot spot detection within the optical variation space and hot spot fixing by layout modification or OPC optimization, ii) in order to efficiently detect hot spots within the optical variation space, lithography simulation by combinations of optical parameters determined by the design of experiment (DoE), iii) at the manufacturing stage, hot spot fixing by adjustment of optical parameters using the multi-variable optimization to match OPE between the primary and secondary exposure tool.
Published Version
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