TiO[sub 2] Film Deposition by Atmospheric Thermal Plasma CVD Using Laminar and Turbulence Plasma Jets

Abstract

In this study, to provide continuous plasma atmosphere on the substrate surface in the case of atmospheric thermal plasma CVD, TiO2 film deposition by thermal plasma CVD using laminar plasma jet was carried out. For comparison, the film deposition using turbulence plasma jet was conducted as well. Consequently, transition of the plasma jet from laminar to turbulent occurred on the condition of over 3.5 1/min in Ar working gas flow rate and the plasma jet became turbulent on the condition of over 10 1/min. In the case of the turbulent plasma jet use, anatase rich titanium oxide film could be obtained though plasma jet could not contact with the surface of the substrate continuously even on the condition that feedstock material was injected into the plasma jet. On the other hand,, in the case of laminar gas flow rate, the plasma jet could contact with the substrate continuously without melt down of the substrate during film deposition. Besides, titanium oxide film could be obtained even in the case of the laminar plasma jet use. From these results, this technique was thought to have high potential for atmospheric thermal plasma CVD.