Abstract
The multi layered structure was designed for the possible application of transparent electrodes in PDP (Plasma Display Panel). Multi layered film was deposited on a glass substrate at room temperature by DC/RF magnetron sputtering system and EMP (Essential Macleod Program) was adopted to optimize the optical characteristics of film. During the deposition process, the Ag layer in became heavily oxidized and the filter characteristic was degraded easily. In thus study, Si3N4 layer was used as a diffusion buffer layer between and Ag. in order to prevent the oxidation of Ag layer in structure. It was confirmed that layer is one of candidate materials acting as diffusin barrier between .
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More From: Journal of the Korean Institute of Electrical and Electronic Material Engineers
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