Abstract
A superhydrophobic–superhydrophilic pattern was prepared on an anodized Al plate by a new fabrication process. The process consists of five key steps: (1) TiO 2 coating of the plate, (2) surface modification with self-assembled monolayers (SAMs), (3) formation of aqueous UV light-resistant ink patterns by an ink-jet technique, (4) photocatalytic decomposition of SAMs and surface conversion to the superhydrophilic state and (5) removal of the aqueous ink patterns by water washing. It is particularly noteworthy that the wettability pattern can be quickly formed on the plate, without the use of a photomask. The fabricated superhydrophobic–superhydrophilic pattern is shown to be applicable to offset printing.
Published Version
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