Abstract

Patterning an oil-based ink on a solid surface based on a wettability difference is of significant importance for the application of offset printing. Herein, we describe a large-area patterning of oil-based ink on a self-organized TiO2 nanotubular layer based on a photocatalytic wettability conversion. The TiO2 nanotubular layer was fabricated by electrochemical anodization, which demonstrated a superhydrophobic wettability after modification with a self-assembled molecular layer. Subsequently, area-selective ultraviolet (UV) irradiation through a pre-designed pattern of water-based UV-resistant ink formed by an ink-jet technique was used to form a wettability difference. After removing the water-based ink, an oil-based ink was capable of depositing selectively on the superhydrophobic area to form the same pattern as the pre-designed pattern of water-based ink. This large-area patterning of an oil-based ink based on the photocatalytic wettability conversion is potentially applicable in offset printing.

Highlights

  • IntroductionThe creation of a wettability difference on a solid surface has attracted significant attention for practical applications [1,2,3,4,5,6,7,8,9,10,11,12,13,14,15,16,17,18,19,20,21,22,23]

  • Molecular layers (SAMs), a superhydrophobic surfaceink waswas obtained superhydrophobic surface by of anwater-based ink-jet technique, which functioned as a UV-resistant photomask

  • A large-area patterning of oil-based ink was achieved on a superhydrophobic TiO2 nanotubular layer based on a UV-induced photocatalytic wettability conversion

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Summary

Introduction

The creation of a wettability difference on a solid surface has attracted significant attention for practical applications [1,2,3,4,5,6,7,8,9,10,11,12,13,14,15,16,17,18,19,20,21,22,23]. One of the applications is to use the wettability difference to pattern an oil-based ink on a solid surface for offset printing [21,22,23]. Area-selective UV irradiation through a photomask on a SAMs-modified superhydrophobic TiO2 surface can be used to fabricate a wettability difference

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