Three-dimensional process simulation

Abstract

Within the JESSI/ESPRIT project PROMPT, a program system for the multidimensional simulation of semiconductor fabrication steps is being developed. The overall goal is to provide appropriate information on the three-dimensional device geometry and dopant distributions as input to three-dimensional device simulation. For this purpose, both existing one- and two-dimensional process simulation programs and newly developed three-dimensional simulation modules are being used. In addition to the general concept of the PROMPT system, a brief description of the approaches used for the three-dimensional simulation of the main process steps is given.