Abstract
Interference lithography is an attractive technique for the creation of three dimensional photonic crystals. Structures with potential for photonic applications are fabricated in a photoresist through concurrent exposure with four coherent beams of laser radiation. The polymer-air templates are used to create higher refractive index contrast photonic crystals by infilling using atomic layer deposition followed by chemical vapor deposition. These photonic crystals exhibit excellent optical properties with strong reflectance peaks at the calculated band gap frequencies. Two-photon polymerization is used to demonstrate the ability to create designed defect structures such as waveguides in silicon-air photonic crystals.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
