Three-dimensional microstructure elements fabricated by electron beam lithography and dry etching technique

Abstract

The fabrication of three-dimensional microstructure elements by electron-beam lithography and dry etching technique is shown for the example of typical three-dimensional optical structures (Echelette gratings, computer generated diffractive optical elements and Fresnel zone lenses). Several different structures, mainly for use in micro-optics with feature sizes in the micrometer range and below were realised. The utilisation of electron-beam lithography thereby proved to be extremely flexible and precise.