Abstract
Plasma immersion ion implantation is a fast method for ion implantation into complex-shaped three-dimensional objects as the ions are accelerated from the receding plasma sheath edge towards the substrate during the negative high-voltage pulses. Except for the region near the edges, homogeneous implantation can be obtained for the surface of flat samples. Here, it is shown that a much larger absolute dose and a much larger dose variation is observed on the back side of rectangular stainless steel samples—resulting in highly localized corrosion—due to the interference of the supporting rod connected to the high voltage-feed through.
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