Abstract
ABSTRACTThe design and fabrication of novel, thin-film continuous dynodes for a new generation of channel electron multipliers (CEMs) and microchannel plates (MCPs) are described. In particular, we demonstrate the feasibility of forming such dynodes by low pressure chemical vapor deposition (LPCVD) of amorphous Si films in capillary channels of macroscopic to microscopic dimensions. Finally, we discuss potential performance advantages of thin-film dynodes over conventional reduced lead silicate glass dynodes for CEMs and MCPs and implications for new applications.
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