Abstract
The effects of partially ionized vapour deposition on the morphology of tellurium films on KBr substrates were investigated. Compared with films formed by conventional neutral vapour deposition, films prepared by partially ionized vapour deposition show several pronounced structural features: (1) enhanced surface coverage on the substrate; (2) disappearance of the separate tips in the shape of a swallow's tail which grow on the end of the crystallites formed by neutral vapour deposition; (3) almost no decoration effect along the step line of the cleavage face of KBr substrates. Enhanced surface coverage of the tellurium film also occurred on glass and mica substrates.
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