Abstract
Thin films of aromatic terbium carboxylates are promising materials for application in different optical devices. However, thin films deposition of these compounds by common methods is almost impossible due to their low solubility in most common organic solvents and nonvolatility. In our previous work it was shown that thin films of one of the simplest aromatic terbium carboxylate Tb(bz)3 (Hbz - benzoic acid) can be obtained by the original approach based on the exchange reaction between volatile precursors - reactive CVD (RCVD). Herein we improved this approach and demonstrated its possibilities and advantages on deposition of thin films of new emissive material - Tb(pobz)3 (Hpobz - phenoxybenzoic acid). The bulk products and thin films of Tb(pobz)3, obtained by RCVD method were characterized by elemental analysis, IR-, Raman and photoluminescent spectroscopy as well as thin films were studied by AFM and SEM techniques.
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