Abstract
The construction and use of a chamber for the production of thin films from milligram quantities of separated isotopes by cathodic sputtering are described. It is adapted for the coating of thin substrates supported on frames suitable for use as accelerator targets or beta spectroscopy sources. Typical operating conditions yield films of various metals, up to opacity in thickness, in one to twelve hours. Details are included for the sputtering of osmium.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have