Thin Film Passivation Characteristics in OLED Using In-situ Passivation

Abstract

In this study, the fabrication and the characteristic analyses of OLED using in-situ passivation are investigated. OLEDs represent a disadvantage in decreasing its life due to the degradation caused by the penetration of moisture and oxygen. After the fabrication of OLED, an in-situ passivation method for inorganic thin films is developed. A process that uses PECVD method which can apply a vapor deposition process at room temperature is also developed. Changes in the degradation and electric characteristics of OLEDs are also analyzed by applying <TEX>$SiO_2$</TEX> and SiNx thin films to OLED as a passivation layer. By applying the fabricated thin film to OLEDs as a passivation layer, the moisture penetration in a single layer film is ensured below <TEX>$1{\times}10^{-2}\;g/m^2.day$</TEX>. This leads to the improvement of such degradation characteristics in the application of multilayer films.