Thickness measurements on transparent substrates based on reflection ellipsometry I Optical effects of high-refractive-index additional layers

Abstract

Theoretical studies were conducted for thickness measurements using transparent substrates on the external and internal reflection configurations. For three-phase systems consisting of ambient, film, and substrate, the refractive index of the substrate could be optimized to obtain the high sensitivity of an ellipsometric quantity delta to the film thickness and the small susceptibility of delta to errors in the incident angle. It was shown that the combination of an ordinary glass substrate and an additional dielectric layer with an appropriate layer thickness works as a synthetic high-index single substrate (SHIS). The optical effect of the combination was approximately described by use of the effective refractive index of SHIS. A method to select the refractive index of the additional layer was also given.