Simulated annealing algorithm for the optimal design of diffractive structures under fluctuation models

Abstract

In this paper, to improve the optimization capability of the simulated annealing algorithm (SA) in the optimal design of diffractive structures, the random fluctuation problem in the algorithm is investigated, and a new fluctuation calculation model is proposed. The optimal design of phase-type diffraction gratings and beam-shaping devices verified the fast accuracy of the proposed model. The simulation experimental results show that the model’s introduction is particularly significant in substantially reducing computation time (a threefold increase in computation speed) and improving the algorithm’s optimization finding capability. Finally, the setting of the model parameters is discussed analytically to make the proposed model more applicable and robust. The study results provide guidance and assistance for higher speed and effectiveness in the optimal design using simulated annealing algorithms. It can be applied to any complex and large-scale optimization calculation problem.