Thick polycrystalline MgB2 film on Cu substrate by hybrid physical–chemical vapour deposition

Abstract

Thick MgB2 films have been grown on Cu substrates by the technique of hybridphysical–chemical vapour deposition (HPCVD). The films are about2–3 µm thick and arequite dense. The Tc (onset) is as high as 37–38 K and sharp, ∼0.7 K. X-ray diffraction indicates that the films show a highly textured polycrystalline character. The uppercritical field, Hc2(0) at T = 0 K, is extrapolated as 15.3 T. The controlled growth ofMgB2 film on Cu substrate provides an alternative route for the preparation ofMgB2 tape materials.