Abstract
The phase stability of amorphous Ge2Sb2Te5 (GST) films affects the performance and reliability of phase change memory (PRAM) devices. The viscosity and the glass forming ability of nitrogen (N)-doped amorphous GST films were investigated in terms of thermomechanical behavior using wafer curvature measurements. The viscosity which increased by two orders of magnitude was observed in the N-doped amorphous GST film by measuring the stress relaxation accompanied by bimolecular structural relaxation. The glass forming ability (ΔTx), difference between the glass transition temperature (Tg) and the crystallization temperature (Tc), of GST increased as the nitrogen contents increased. These increases in the viscosity and ΔTx indicate the retardation of atomic diffusion in amorphous GST and the stabilization of the amorphous phase.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
