Abstract
We have calculated the equilibrium composition of the solid phase produced in the metallorganic chemical vapor deposition (MOCVD) process that uses , ,, and oxygen as reactants either separately or together. The results indicate that barium strontium titanate (BST) films of good dielectric properties are obtained when a proper amount of the Ti source is used in the chemical vapor deposition (CVD) feed. The Ti source is effective in modifying the Ba and Sr fractions in the BST films, but the Ba source is not so effective in modifying the film composition. Oxygen addition to the feed suppresses graphite deposition but does not affect the metal composition of the film.
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