Thermal-Mechanical Property of High Aspect Ratio TSV in Advanced IC integration and Packaging

Abstract

Advanced packaging of integrated circuits (IC) plays a critical role on the way towards high performance, high density, low power consumption and light weight of electronics. Through-silicon vias (TSV) is the heart of 3D IC integration and packaging. However, copper protrusion due to mismatch of coefficients of thermal expansion (CTE) between copper and silicon, which may result in the dielectric material breakdown, becomes the bottleneck of TSV in high-temperature application. In this paper, thermal-mechanical property of high aspect ratio TSV is investigated through experiments under different annealing process, which will help to accelerate the widely application of TSV in advanced packaging of electronics in the future.