Abstract
The lattice parameters of as-prepared and annealed Co nanowires with hcp and fcc structures have been measured using the in situ high-temperature x-ray diffraction method. The hcp and fcc Co nanowires have been fabricated within the porous anodic alumina membranes by a direct-current electrodeposition technique. The results indicate that the variational quantity of the interplanar spacing for hcp Co nanowire arrays is bigger than that for fcc Co nanowire arrays in spite of as-prepared and annealed samples. The structural difference between hcp and fcc Co nanowires results in the different thermal expansion behaviors.
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