Abstract
During the last years, a growing interest in the creation of micro- and nanoelectronic devices by use of the swift heavy ion track technology in a combination with carbon nanotubes (CNTs) is observed in several research centers worldwide. The CNTs were grown in etched ion tracks in SiO2 layers on Si. For this purpose, Ni-catalyst nanoclusters were electrochemically deposited within the ion tracks. The geometry of the obtained nanostructures has been analyzed. Structure features of CNTs obtained by thermal chemical vapor deposition have been investigated.
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