Abstract

We study strongly confined plasmons in ultrathin gold and silver films by simulating electron energy-loss spectroscopy (EELS). Plasmon dispersion relations are directly retrieved from the energy- and momentum-resolved loss probability under normal incidence conditions, whereas they can also be inferred for aloof parallel beam trajectories from the evolution of the plasmon features in the resulting loss spectra as we vary the impinging electron energy. We find good agreement between nonlocal quantum-mechanical simulations based on the random-phase approximation and a local classical dielectric description for silver films of different thicknesses down to a few atomic layers. We further observe only a minor dependence of quantum simulations for these films on the confining out-of-plane electron potential when comparing density-functional theory within the jellium model with a phenomenological experimentally-fitted potential incorporating atomic layer periodicity and in-plane parabolic bands of energy-dependent effective mass. The latter shows also a small dependence on the crystallographic orientation of silver films, while the unphysical assumption of energy-independent electron mass leads to spurious features in the predicted spectra. Interestingly, we find electron band effects to be more relevant in gold films, giving rise to blue shifts when compared to classical or jellium model simulations. In contrast to the strong nonlocal effects found in few-nanometer metal nanoparticles, our study reveals that a local classical description provides excellent quantitative results in both plasmon strength and dispersion when compared to quantum-mechanical simulations down to silver films consisting of only a few atomic layers, thus emphasizing the in-plane nearly-free conduction-electron motion associated with plasmons in these structures.

Highlights

  • We show examples of the two types of confining electron potentials used in our randomphase approximation (RPA) calculations for Ag films in Figs. 1(a) and 1(b), along with the resulting conductionelectron charge densities

  • We have shown that a local classical dielectric model predicts reasonably well the intensities and dispersion relations of plasmons in ultrathin silver films when compared to quantum-mechanical simulations based on the RPA with different potentials used to simulate the conduction oneelectron wave functions

  • We attribute the small effects of nonlocality and quantum confinement in the plasmonic response of these films to the fact that their associated electron motion takes place along in-plane directions, in contrast to metal nanoparticles with a similar size as the film thickness here considered

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Summary

INTRODUCTION

Surface plasmons—the collective electron oscillations at material surfaces and interfaces—provide the means to concentrate and amplify the intensity of externally applied light down to nanoscale regions [1,2], where they interact strongly with molecules and nanostructures, becoming a powerful asset in novel applications [3] such as biosensing [2,4,5], photocatalysis [6,7], energy harvesting [8,9], and nonlinear optics [10,11,12,13]. Our results are in excellent agreement with classical dielectric theory based on the use of frequency-dependent dielectric functions for both Ag and Au films of small thickness down to a few atomic layers This conclusion is in stark contrast to the strong nonlocal effects observed in metal nanoparticles of similar or even larger diameter [50,51], a result that we attribute to the predominance of in-plane electron motion associated with the low-energy plasmons of thin films, unlike the combination of in- and out-of-plane motion in higher-energy SPPs. We provide a comprehensive description of the influence of various quantum-mechanical effects, such as the variation of the effective mass in the dispersion relation of electronic quantum-well states in the thin films, the detailed dependence on the model used to describe valence electrons, and the inclusion of electron spillout and surface orientation

THEORETICAL FORMALISM
RPA susceptibility of thin metal films
EELS probability under normal incidence
EELS probability in the aloof configuration
RESULTS AND DISCUSSION
CONCLUSION
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