Abstract
We theoretically study and propose the design concept of a new non-contact measurement method of the thickness and refractive index of dielectric film. The needed measurement set-up includes a probe, an optical detection head and a spectrometer. The probe is composed of two patches of dielectric substrates, and the optical detection head is used to detect the reflective spectra. After depositing a testing dielectric film on the two patches, the coating film thickness and refractive index can be determined by analyzing the normal-incidence reflective spectra of the two dielectric substrates. This method has two requirements. First, the coating dielectric films on the two substrates must be the same. Second, the two dielectric substrates respectively have higher and lower refractive indices than the testing dielectric film.
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