Abstract

This is a comprehensive study of the ultrananocrystalline diamond renucleation rate. The films deposited in a hot-filament chemical vapor deposition system (HFCVD) used an argon rich environment (90vol.%), known as ideal for ultrananocrystalline diamond deposition. Substrate temperature (750°C), total pressure (30Torr) argon flow rate (180sccm) were constant in all experiments. Methane concentrations of 0.25, 0.5, 1, 1.5 and 2vol.% balanced with hydrogen to a total flow rate of 20sccm. Scanning electron microscopy (SEM) let morphology inspection. Visible-Raman scattering leaded to estimating relative influence of sp2 bonds. X-ray photoelectron spectroscopy (XPS) measured the chemical bonds distribution. X-ray diffraction assessed crystallinity and diamond renucleation rates. The increase in methane content in the gas mixture promotes morphology changes from micro (faceted), to nano (cauliflower), and to ultrananocrystalline (ballas-like) diamond. It reaches a lamellar graphitic structure at the higher methane concentration. This transition is concurrent with: a decrease of film specific mass, an increase of diamond renucleation rate, an increase of sp2 phase content, as seen by Raman spectroscopy and, an increase of C–H bond associated with C–C bond, as measured by x-ray photoelectron spectroscopy. Renucleation shows up as a very important process that presents a quadratic correlation with [CH4] in the feed gas. This new result may help bridging MCD, NCD and UNCD into a single understanding of diamond growth.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.