Abstract
A method has been elaborated for the separation of certain organosilicon substances containing the phenyl group with the use of thin-layer chromatography. Vapours of fuming nitric acid were employed as the detection agent. A relation has been derived between the R M values and the number of phenyl groups in the molecule. The effects of the other functional groups on the R M values were determined. Structural analysis of polyorganosiloxances eluted after separaton by thin-layer chromatography was carried out by cleaving with boron trifluoride and identification of the products by gas chromatography.
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