The study of copper dissolution in aqueous and nonaqueous systems DMSO-HXsolv (solv = H2O, X = Br, Cl; solv = MeCN, PhNO2; X = Cl) by resistometric method

Abstract

Copper dissolution in the aqueous systems DMSO-HXsolv (solv = H2O; X = Cl, Br) under the inert atmosphere and under aerobic conditions at different acid concentrations was studied by the resistometric method by measuring the resistance of a metal sample in the course of the reaction. The overall activity of the system decreases with a decrease in the concentration of the starting hydrohalic acid. The rate of copper dissolution in the extremum points also decreases. The process of the metallic copper dissolution in nonaqueous systems, such as DMSO-HClsolv (solv = MeCN, PhNO2), was studied. In the latter systems, as opposed to aqueous systems, only one maximum in the plot of the copper dissolution rate versus the component ratio is observed. The change in the nature of the solvent in the donor-acceptor electron transport system DMSO-HClsolv (solv = H2O, MeCN, PhNO2) results in the change in the position of the maximum of the copper dissolution rate, as well as in the change in its value. The rate of copper dissolution in the above mentioned systems varies in the following series: H2O < MeCN < PhNO2.