Abstract
ABSTRACTThe internal structures of various (ZrO2)x(SiO2)1-x alloys (x ≤ 0.5) were investigated. A remote plasma enhanced-metal organic chemical vapor deposition (RPEMOCVD) process was used to deposit films with varying alloy composition on Si(100) substrates. This study indicates that for the glassy silicate phase, g-ZrSiO4, a glass transition temperature, Tg, exists between 800°C and 900°C at which phase separation into the end-member components, SiO2 and ZrO2, occurs.
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